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Cr-Si resistive films produced by magnetron-plasmatron sputtering
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1982
Journal Article
Title
Cr-Si resistive films produced by magnetron-plasmatron sputtering
Author(s)
Schiller, S.
Heisig, U.
Steinfelder, K.
Korndörfer, C.
Journal
Thin solid films
DOI
10.1016/0040-6090(82)90511-9
Language
English
Fraunhofer-Institut für Elektronenstrahl- und Plasmatechnik FEP
