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  4. 12% efficient CdTe/CdS thin film solar cells deposited by low-temperature close space sublimation
 
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2011
Journal Article
Title

12% efficient CdTe/CdS thin film solar cells deposited by low-temperature close space sublimation

Abstract
We report 12% efficient CdS/CdTe thin film solar cells prepared by low temperature close space sublimation (CSS). Both semiconductor films, CdS and CdTe, were deposited by high vacuum CSS in superstrate configuration on glass substrates with fluorine doped tin oxide (FTO) front contact. The CdTe deposition was carried out at a substrate temperature (Tsub) of 340° C, which is much lower than that used in conventional processes (>500 ° C). The CdTe films were treated with the usual CdCl 2 activation process. Different optimal annealing times and temperatures were found for low-temperature cells (Tsub 340°C) compared to high-temperature cells (Tsub = 520°C). The influence of the activation step on the morphology of high-temperature and low-temperature CdTe is determined by XRD, AFM, SEM top views, and SEM cross-sections. Grain growth, strong recrystallization, and a reduction of planar defects during the activation step are observed, especially for low-temperature CdTe. Further, the influence of CdS deposition parameters on the solar cell performance is investigated by using three different sets of parameters with different deposition rates and substrate temperatures for the CdS preparation. Efficiencies about 10.9% with a copper-free back contact and 12.0% with a copper-containing back contact were achieved using the low temperature CdTe process.
Author(s)
Schaffner, J.
Technische Universität Darmstadt
Motzko, M.
Technische Universität Darmstadt
Tueschen, A.
Technische Universität Darmstadt
Swirschuk, A.
Technische Universität Darmstadt
Schimper, H.-J.
Technische Universität Darmstadt
Klein, A.
Technische Universität Darmstadt
Modes, T.
Fraunhofer-Institut für Organische Elektronik, Elektronenstrahl- und Plasmatechnik FEP  
Zywitzki, O.
Fraunhofer-Institut für Organische Elektronik, Elektronenstrahl- und Plasmatechnik FEP  
Jaegermann, W.
Technische Universität Darmstadt
Journal
Journal of applied physics  
Open Access
DOI
10.1063/1.3639291
Additional full text version
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Language
English
Fraunhofer-Institut für Organische Elektronik, Elektronenstrahl- und Plasmatechnik FEP  
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