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  4. Characterizing the degradation of PDMS stamps in nanoimprint lithography
 
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2017
Journal Article
Title

Characterizing the degradation of PDMS stamps in nanoimprint lithography

Abstract
Within this work we investigate the lifetime of soft PDMS stamps as a critical parameter for the up-scaled fabrication of microstructures via nanoimprint lithography. We propose the characterization of the PDMS hardness as a suitable parameter for the stamp degradation. The increasing hardness for a larger number of imprints is attributed to resist diffusion into the PDMS volume and possibly subsequent cross-linking. Force-distance measurements with an atomic force microscope were applied to demonstrate for two acrylic materials that a lower average molecular weight leads to a faster degradation. Using a temperature-assisted UV-imprint process with an epoxy material (SU-8 2002) enabled more than 100 imprints without measurable degradation due to the complex molecular structure which we assume to reduce the resist diffusion. This can be a key development towards a higher stamp lifetime and finally an industrial realization of NIL.
Author(s)
Tucher, Nico
Höhn, Oliver  
Hauser, Hubert  
Müller, C.
Bläsi, Benedikt  
Journal
Microelectronic engineering  
DOI
10.1016/j.mee.2017.05.049
Language
English
Fraunhofer-Institut für Solare Energiesysteme ISE  
Keyword(s)
  • Solarzellen - Entwicklung und Charakterisierung

  • Photovoltaik

  • Silicium-Photovoltaik

  • Neuartige Photovoltaik-Technologien

  • Oberflächen - Konditionierung

  • Passivierung

  • Lichteinfang

  • Photonenmanagement

  • lithography

  • up-scaling

  • replication

  • lifetime

  • force microscopy

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