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1995
Conference Paper
Title
Pulsed laser deposition of laterally graded X-ray optical multilayers on substrates of technical relevance
Title Supplement
Vortrag in Symposium G.
Other Title
Pulsed Laser Deposition von Gradientenmultischichten für röntgenoptische Anwendungen auf technisch relevanten Substraten
Abstract
Pulsed Laser Deposition (PLD) is used for the preparation of Ni/C, W/C, and Mo/Si multilayers having X-ray optical quality. For the synthesis of layer stacks involving a uniform or a graded thickness distribution across 4"-wafers the conventional thin film deposition equipment of PLD has been modified. This modification provides a precise spatial control of the plasma plume orientation in the deposition chamber. With this arrangement the emission characteristic of the plasma source can be computer controlled and the desired coating profile can be tailored across an extended substrate via a stepper-motor-driven target manipulator. Thus, e.g., film thickness uniformity (Delta t(ind s)smaller than 2%) is obtained on substrates up to 4" diameter even for smaller target-substrate distances. For laterally graded Ni and individual layers linear thickness gradients of dt(ind s)/dx = 3.2 x 10(exp-8) were confirmed over the total substrate length by spectroscopic ellipsometry. The parameters ded uced from single layer deposition were applied for the synthesis of laterally graded Ni/C multilayers. A mean value of the gradient of the stack period thickness dt/dx = 6.2 x 10(exp-8) confirmed by X-ray reflectometry (nominal value dt(ind 0)/dx = 6.4 x 10(exp-8)) characterises precision and reproducibility of the coating process.
Language
English
Keyword(s)
Ellipsometrie
ellipsometry
Gradientenmultischicht
Großflächenbeschichtung
large area PLD
laser ablation
laterally graded multilayer
Ni/C-multilayer
Ni/C-Multischicht
pulsed laser deposition
Röntgenreflektometrie
Röntgenspiegel
transmission electron microscopy
Transmissionselektronenmikroskopie
X-ray mirror
X-ray reflectrometry