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1985
Journal Article
Title
NpnN double-heterojunction bipolar transistor on InGaAsP/InP
Abstract
Double-heterojunction bipolar transistors have been fabricated on InGaAs(P)/InP with current gains of up to 200. Transistors with a p+-InGaAs/N-InP base/collector junction exhibited drastic gain reduction at low collector bias voltages which is ascribed to the electron repelling effect of the conduction-band spike formed at the collector heterojunction. To overcome this complication a thin n-InGaAs transition layer was inserted between the ternary base and the InP wide-gap collector. The resulting nN double-layer collector structure leads to excellent current/voltage characteristics.
Keyword(s)
bipolar transistors
gallium arsenide
iii-v semiconductors
indium compounds
semiconductors
n p n n double-heterojunction bipolar transistor
InGaAsp/InP
current gains
p+-InGaAs/ n-InP base/collector junction
gain reduction
electron repelling effect
conduction-band spike
thin n-InGaAs transition layer
ternary base
InP wide-gap collector
n n double-layer collector structure
current/voltage characteristics