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  4. NpnN double-heterojunction bipolar transistor on InGaAsP/InP
 
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1985
Journal Article
Title

NpnN double-heterojunction bipolar transistor on InGaAsP/InP

Abstract
Double-heterojunction bipolar transistors have been fabricated on InGaAs(P)/InP with current gains of up to 200. Transistors with a p+-InGaAs/N-InP base/collector junction exhibited drastic gain reduction at low collector bias voltages which is ascribed to the electron repelling effect of the conduction-band spike formed at the collector heterojunction. To overcome this complication a thin n-InGaAs transition layer was inserted between the ternary base and the InP wide-gap collector. The resulting nN double-layer collector structure leads to excellent current/voltage characteristics.
Author(s)
Su, L.M.
Grote, N.
Kaumanns, R.
Schroeter, H.
Journal
Applied Physics Letters  
DOI
10.1063/1.96392
Additional link
Full text
Language
English
Fraunhofer-Institut für Nachrichtentechnik, Heinrich-Hertz-Institut HHI  
Keyword(s)
  • bipolar transistors

  • gallium arsenide

  • iii-v semiconductors

  • indium compounds

  • semiconductors

  • n p n n double-heterojunction bipolar transistor

  • InGaAsp/InP

  • current gains

  • p+-InGaAs/ n-InP base/collector junction

  • gain reduction

  • electron repelling effect

  • conduction-band spike

  • thin n-InGaAs transition layer

  • ternary base

  • InP wide-gap collector

  • n n double-layer collector structure

  • current/voltage characteristics

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