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  4. Ferroelectric FETs with Separated Capacitor in the Back-End-of-Line: Role of the Capacitance Ratio
 
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2022
Journal Article
Title

Ferroelectric FETs with Separated Capacitor in the Back-End-of-Line: Role of the Capacitance Ratio

Abstract
Hafnium oxide based ferroelectric (FE) memory concepts like FE field effect transistors (FeFETs) will become increasingly important. They are highly scalable, provide high operation speed, and consume low power. Just recently, an 1T1C FeFET concept with one transistor (1T) and one separated FE capacitor (1C) was demonstrated. This alternative approach is promising to overcome the drawbacks usually observed for the classic 1T concept like limited endurance, reduced retention, and high device-to-device variability. Electrically, the 1T1C FeFET consists of a series connection of the FE capacitor and the gate oxide capacitance. To operate at low voltages, a large fraction of the applied voltage must drop across the FE, which can be achieved by optimizing the capacitance ratio. Herein, 1T1C FeFETs with various capacitance ratios are fabricated and its impact on the electrical performance is discussed. Furthermore, the observed endurance of up to 108 field cycles illustrates the great potential of the new concept.
Author(s)
Lehninger, David
Fraunhofer-Institut für Photonische Mikrosysteme IPMS  
Hoffmann, Raik  
Fraunhofer-Institut für Photonische Mikrosysteme IPMS  
Sünbül, Ayse
Fraunhofer-Institut für Photonische Mikrosysteme IPMS  
Mähne, Hannes
Kämpfe, Thomas  orcid-logo
Fraunhofer-Institut für Photonische Mikrosysteme IPMS  
Bernert, Kerstin
Thiem, Steffen
Seidel, Konrad  
Fraunhofer-Institut für Photonische Mikrosysteme IPMS  
Journal
IEEE Electron Device Letters  
Open Access
DOI
10.1109/LED.2022.3204360
Language
English
Fraunhofer-Institut für Photonische Mikrosysteme IPMS  
Keyword(s)
  • 1T1C

  • BEoL integration

  • capacitance ratio

  • FeFET

  • Ferroelectric

  • hafnium oxide

  • memory

  • MFMIS

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