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  4. Photocatalytic properties of TiO2 thin films modified with Ag and Pt nanoparticles deposited by gas flow sputtering
 
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2015
Journal Article
Title

Photocatalytic properties of TiO2 thin films modified with Ag and Pt nanoparticles deposited by gas flow sputtering

Abstract
In this work, a gas flow sputtering (GFS) process which allows the production and deposition ofmetal nanoparticles (NPs) in a vacuum environment is described. Aim of the study is to prove thepotential of this technology for the fabrication of new TiO2 films with enhanced photocatalytic properties.For this purpose, Ag and Pt NPs have been produced and deposited on photocatalytic floatglass coated with TiO2 thin films by magnetron sputtering. The influence of the process parametersand of the metal amount on the final properties of the particles (quantity, size, size distribution,oxidation state etc.,) was widely investigated. Moreover, the effect of the NPs on the photocatalyticactivity of the resulting materials was evaluated for the case of the decomposition of stearic acid(SA) during UV-A irradiation. The reduction of the water contact angle (WCA) during the irradiationperiod was measured in order to test the photo-induced super-hydrophilicity (PSH).
Author(s)
Maicu, Marina
Fraunhofer-Institut für Organische Elektronik, Elektronenstrahl- und Plasmatechnik FEP  
Glöß, Daniel  
Fraunhofer-Institut für Organische Elektronik, Elektronenstrahl- und Plasmatechnik FEP  
Frach, Peter  
Fraunhofer-Institut für Organische Elektronik, Elektronenstrahl- und Plasmatechnik FEP  
Hecker, Dominic  
Fraunhofer-Institut für Organische Elektronik, Elektronenstrahl- und Plasmatechnik FEP  
Gerlach, Gerald
TU Dresden, IFE
Cordoba, Jose M.
ICMS, Spain
Journal
Journal of nanoscience and nanotechnology  
DOI
10.1166/jnn.2015.10873
Language
English
Fraunhofer-Institut für Elektronenstrahl- und Plasmatechnik FEP  
Keyword(s)
  • gas flow sputtering

  • thin films

  • TiO2

  • nanoparticles

  • photocatalysis

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