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  4. Self-organized, effective medium Black Silicon for infrared antireflection
 
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2015
Journal Article
Titel

Self-organized, effective medium Black Silicon for infrared antireflection

Abstract
Statistical Black Silicon antireflection structures for the mid-infrared spectral region, fabricated by Inductively Coupled Plasma Reactive Ion Etching, are investigated. Upon variation of etch duration scaling of the structure morphologies is observed and related to the optical losses in specular transmittance. By means of statistical morphology analysis, an effective medium criterion for the examined structures is derived that can be used as a design rule for maximizing sample transmittance at a given wavelength. To obtain Black Silicon antireflection structures with elevated bandwidth, an additional deep-etch step is proposed and demonstrated.
Author(s)
Steglich, Martin
Käsebier, Thomas
Schrempel, Frank
Kley, Ernst-Bernhard
Tünnermann, Andreas
Zeitschrift
Infrared physics and technology
Thumbnail Image
DOI
10.1016/j.infrared.2015.01.033
Language
English
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Fraunhofer-Institut für Angewandte Optik und Feinmechanik IOF
Tags
  • inductively coupled plasma

  • morphology

  • silicon

  • trenching

  • anti-reflection

  • black silicon

  • effective medium

  • moth-eye structure

  • silicon optics

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