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  4. Hierarchical simulation of process variations and their impact on circuits and systems: Results
 
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2011
Journal Article
Title

Hierarchical simulation of process variations and their impact on circuits and systems: Results

Abstract
Process variations increasingly challenge the manufacturability of advanced devices and the yield of integrated circuits. Technology computer-aided design (TCAD) has the potential to make key contributions to minimize this problem, by assessing the impact of certain variations on the device, circuit, and system. In this way, TCAD can provide the information necessary to decide on investments in the processing level or the adoption of a more variation tolerant process flow, device architecture, or design on circuit or chip level. Five Fraunhofer institutes joined forces to address these issues. Their own software tools, e.g., for lithography/topography simulation, mixed-mode device simulation, compact model extraction, and behavioral modeling, have been combined with commercial tools to est ablish a hierarchical system of simulators in order to analyze process variations from their source, e.g., in a lithography step, through device fabrication up to the circuit and system levels.
Author(s)
Lorenz, J.K.
Bär, E.
Clees, Tanja  orcid-logo
Evanschitzky, P.
Jancke, R.
Fraunhofer-Institut für Integrierte Schaltungen IIS  
Kampen, C.
Paschen, U.
Fraunhofer-Institut für Mikroelektronische Schaltungen und Systeme IMS  
Salzig, C.P.J
Selberherr, S.
Journal
IEEE transactions on electron devices  
DOI
10.1109/TED.2011.2150226
Language
English
Fraunhofer-Institut für Integrierte Schaltungen IIS  
Fraunhofer-Institut für Integrierte Systeme und Bauelementetechnologie IISB  
Fraunhofer-Institut für Mikroelektronische Schaltungen und Systeme IMS  
Fraunhofer-Institut für Techno- und Wirtschaftsmathematik ITWM  
Fraunhofer-Institut für Algorithmen und Wissenschaftliches Rechnen SCAI  
Keyword(s)
  • process variation

  • process simulation

  • device simulation

  • circuit simulation

  • system simulation

  • manufacturability

  • process modeling

  • semiconductor device modeling

  • sensitivity

  • yield

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