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  4. Micro-patterning of scintillating films by Liquid Phase Epitaxy: A proof of concept
 
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2024
Journal Article
Title

Micro-patterning of scintillating films by Liquid Phase Epitaxy: A proof of concept

Abstract
Micro-patterning is important in many fields in order to improve, tune, or alter the properties of materials. For scintillating screens, micro-patterning is studied to extract more light, as well as to provide a better compromise between X-ray absorption efficiency and spatial resolution. This article presents an innovative way to micro-pattern scintillating screens by combining Ultrashort Pulse (USP) laser treatment followed by vertical Liquid Phase Epitaxy (LPE). Starting from planar micro-modified (010)-oriented LYSO:Ce substrates, micro-patterned LSO:Tb films comprising square pixels/pillars and covering a surface of 8 mmx8 mm are obtained up to thickness. For thicker films, the morphology of the pixels/pillars evolves towards a truncated pyramidal shape, limiting the maximal thickness to 30 - before pixels start to overlap significantly. This is shown by optical, confocal and Scanning Electron Microscopy (SEM). According to X-ray Diffraction (XRD), the micro-patterned films grow along the (010) substrate orientation, with a close crystalline quality to the planar films. The micro-patterned LSO:Tb films display the green luminescence from the Tb ion, as confirmed by photo and radio-luminescence. Moreover, the light is effectively extracted from the pixels/pillars.
Therefore, the described process could be extended to other oxide materials and pave the way for new opportunities in micro-patterning inorganic scintillators.
Author(s)
Douissard, Paul-Antoine
Wollesen, Laura
Pauwels, Kristof
Loiko, Pavel
Brasse, Gurvan
Simeth, Sebastian Johann
Fraunhofer-Institut für Lasertechnik ILT  
Reininghaus, Martin  
Fraunhofer-Institut für Lasertechnik ILT  
Schaaf, Mathieu Julien
Dujardin, Christophe
Camy, Patrice
Martin, Thierry
Journal
Optical materials  
DOI
10.1016/j.optmat.2024.114939
Language
English
Fraunhofer-Institut für Lasertechnik ILT  
Keyword(s)
  • Micro-patterned scintillator

  • Liquid Phase Epitaxy

  • Material modification by Ultra-Short Pulsed

  • laser

  • Luminescence properties

  • Crystalline structure

  • X-ray imaging

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