2010
Conference Paper
Title

Particle generation during reactive magnetron sputtering of SiO2 with cylindrical and planar cathodes

Abstract
SiO2 layers were deposited by pulsed reactive magnetron sputtering with cylindrical and planar dual magnetrons. The particle density in SiO2 films deposited at different process parameters is analyzed.
Author(s)
Vergöhl, M.
Rademacher, D.
Mainwork
Conference
DOI
Language
English