Effect of process parameters on structure and piezoelectric properties of AlN and AlXSc1-XN films deposited by pulsed magnetron sputtering

The paper will report on the deposition and characterization of piezoelectric AlN and AlXSc1-XN films. Potential applications of the films are in ultrasonic microscopy, energy harvesting and SAW/ BAW filters. Special focus will be on the characterization of the influences of sputter parameters on the structure and the piezoelectric properties of AlXSc1-XN.