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  4. Potential of E-beam lithography for micro- and nano-optics fabrication on large areas
 
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January 2023
Journal Article
Title

Potential of E-beam lithography for micro- and nano-optics fabrication on large areas

Abstract
The availability of high-resolution and high-throughput lithographic fabrication technologies, such as electron-beam lithography, based on variable shaped beam writing and character projection opens the way for the flexible use of various optical nano-structures for some of the most demanding applications. We discuss the technical features, advantages, and limitations of these pattering approaches and show how they can favorably be combined to realize optical nano-structures for applications, which are as diverse as gratings for ultra-short laser pulses or high-resolution spectrometers, computer generated holograms for asphere testing, various optical meta-structures (lenses and gratings), or UV-polarizers.
Author(s)
Zeitner, Uwe Detlef  
Fraunhofer-Institut für Angewandte Optik und Feinmechanik IOF  
Banasch, Michael  
Fraunhofer-Institut für Angewandte Optik und Feinmechanik IOF  
Trost, Marcus  
Fraunhofer-Institut für Angewandte Optik und Feinmechanik IOF  
Journal
Journal of Micro/Nanopatterning, Materials, and Metrology  
Open Access
DOI
10.1117/1.JMM.22.4.041405
Additional full text version
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Language
English
Fraunhofer-Institut für Angewandte Optik und Feinmechanik IOF  
Keyword(s)
  • computer-generated holograms

  • electron-beam lithography

  • gratings

  • optical meta-structures

  • optical micro- and nano-structures

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