The FABLAB concept integration of analytics and metrology in semiconductor industry

The FABLAB concept is characterized by the merger of the exploration of new microscopy, scattering and spectroscopy techniques in out-of-fab laboratories with the implementation of these analytical techniques for the purpose of non-destructive in-line metrology. Both critical measuring tasks for nano-sized features as well as the introduction of advanced materials drive the need to improve the efficiency of existing metrology methods as well as to explore and to implement additional analytical techniques. Research and development in the fields of materials analysis and metrology for micro- and nanoelectronic devices on atomic scale are necessary to support manufacturing processes and thin film materials for next-generation technology nodes. Joint efforts involving institutes as well as supplier and service companies are a prerequisite to make this concept a success.