• English
  • Deutsch
  • Log In
    Password Login
    Research Outputs
    Fundings & Projects
    Researchers
    Institutes
    Statistics
Repository logo
Fraunhofer-Gesellschaft
  1. Home
  2. Fraunhofer-Gesellschaft
  3. Artikel
  4. Reliability of metal-oxide-semiconductor capacitors on pH-silicon carbide
 
  • Details
  • Full
Options
1999
Journal Article
Title

Reliability of metal-oxide-semiconductor capacitors on pH-silicon carbide

Abstract
In this paper the long term stability of polysilicon gated MOS capacitors on 6H-SiC is characterized by voltage ramping, constant current stress and the corresponding charge-to-breakdown values.
Author(s)
Treu, M.
Schorner, R.
Friedrichs, P.
Rupp, R.
Wiedenhofer, A.
Journal
Microelectronic engineering  
Conference
Conference on Insulating Films on Semiconductors 1999  
DOI
10.1016/S0167-9317(99)00381-0
Language
English
IIS-B  
Keyword(s)
  • MOS capacitor

  • semiconductor device breakdown

  • raman silicon anisotropy

  • semiconductor device reliability

  • silicon compounds

  • wide band gap semiconductors

  • Cookie settings
  • Imprint
  • Privacy policy
  • Api
  • Contact
© 2024