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  4. Ferroelectric Hafnium Oxide: A Potential Game-Changer for Nanoelectronic Devices and Systems
 
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2025
Review
Title

Ferroelectric Hafnium Oxide: A Potential Game-Changer for Nanoelectronic Devices and Systems

Abstract
The discovery of ferroelectricity in hafnium oxide has propelled ferroelectric devices to the forefront of nanoelectronics, offering distinct advantages over alternative technologies. Ferroelectric memories, such as Ferroelectric Random Access Memories (FeRAM) and the Ferroelectric Field Effect Transistor (FeFET), combine non-volatility with high-speed operation and low power consumption, though they contend with specific challenges, including variability and endurance limitations. Meanwhile, piezoelectric and pyroelectric sensors/actuators exploit the capability of ferroelectric materials to interconvert mechanical or thermal energy with electrical signals. These sensors demonstrate exceptional sensitivity, though factors such as material fatigue and temperature stability can impact their performance. Additionally, radio frequency devices, particularly varactors, utilize ferroelectric materials to enable tunable capacitance, enhancing dynamic control. This review assesses the advantages and current challenges across these technologies, offering insights into prospective solutions.
Author(s)
Lehninger, David
Fraunhofer-Institut für Photonische Mikrosysteme IPMS  
Müller, Franz  
Fraunhofer-Institut für Photonische Mikrosysteme IPMS  
Raffel, Yannick
Fraunhofer-Institut für Photonische Mikrosysteme IPMS  
Yang, Shouzhuo
Fraunhofer-Institut für Photonische Mikrosysteme IPMS  
Neuber, Markus  
Fraunhofer-Institut für Photonische Mikrosysteme IPMS  
Abdulazhanov, Sukhrob
Fraunhofer-Institut für Photonische Mikrosysteme IPMS  
Kämpfe, Thomas  orcid-logo
Fraunhofer-Institut für Photonische Mikrosysteme IPMS  
Seidel, Konrad  
Fraunhofer-Institut für Photonische Mikrosysteme IPMS  
Lederer, Maximilian
Fraunhofer-Institut für Photonische Mikrosysteme IPMS  
Journal
Advanced electronic materials  
Open Access
DOI
10.1002/aelm.202400686
Additional link
Full text
Language
English
Fraunhofer-Institut für Photonische Mikrosysteme IPMS  
Keyword(s)
  • charge pumping

  • defects

  • fefet

  • ferroelectric

  • flicker noise

  • fram

  • ftj

  • hafnium oxide

  • piezoelectric

  • pyroelectric

  • reliability

  • varactor

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