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  4. Real-time study of dopant incorporation and segregation during MBE growth of GaAs(001):Si
 
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1996
Conference Paper
Title

Real-time study of dopant incorporation and segregation during MBE growth of GaAs(001):Si

Other Title
Echtzeit-Untersuchung des Dotierstoffeinbaus und der Segregation während des MBE-Wachstums von GaAs(001):Si
Abstract
The incorporation as well as segregation of dopant atoms during Si delta-doping of GaAs (001) has been studied in real-time by using reflection high-energy electron diffraction (RHEED) and reflectance anisotropy spectroscopy (RAS). Under conditions of enhanced Si adatom mobility distinct ordering processes are observed, which are promoted by ordered step arrays on the vicinal surface. The demonstrated real-time control of the complete delta-doping process is promising for a tailoring of doping structures.
Author(s)
Däweritz, L.
Schützendübe, P.
Stahrenberg, K.
Maier, M.
Fraunhofer-Institut für Angewandte Festkörperphysik IAF  
Ploog, K.
Mainwork
Compound Semiconductors 1995. Proceedings of the Twenty-Second International Symposium on Compound Semiconductors  
Conference
International Symposium on Compound Semiconductors 1995  
Language
English
Fraunhofer-Institut für Angewandte Festkörperphysik IAF  
Keyword(s)
  • GaAs

  • RAS

  • RHEED

  • segregation

  • Si doping

  • Si-Dotierung

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