• English
  • Deutsch
  • Log In
    Password Login
    Research Outputs
    Fundings & Projects
    Researchers
    Institutes
    Statistics
Repository logo
Fraunhofer-Gesellschaft
  1. Home
  2. Fraunhofer-Gesellschaft
  3. Konferenzschrift
  4. MBE regrowth of InP on patterned surfaces and its application potential for optoelectronic devices
 
  • Details
  • Full
Options
1997
Conference Paper
Title

MBE regrowth of InP on patterned surfaces and its application potential for optoelectronic devices

Abstract
High-quality InP material was grown with solid source molecular beam epitaxy (SSMBE) using a GaP source. Dry- as well as wet-etched corrugated quaternary surfaces (DFB-gratings) were successfully regrown with InP, fully planarized final surfaces were obtained in each case. Finally, InP regrowth on mesa structures demonstrates favourable conditions for butt-coupling integration schemes.
Author(s)
Paraskevopoulos, A.
Kunzel, H.
Bottcher, J.
Urmann, G.
Hensel, H.J.
Bozbek, A.
Mainwork
International Conference on Indium Phosphide and Related Materials, IPRM, 1997. Conference proceedings  
Conference
International Conference on Indium Phosphide and Related Materials (IPRM) 1997  
DOI
10.1109/ICIPRM.1997.600030
Language
English
Fraunhofer-Institut für Nachrichtentechnik, Heinrich-Hertz-Institut HHI  
Keyword(s)
  • diffraction gratings

  • iii-v semiconductors

  • indium compounds

  • molecular beam epitaxial growth

  • optical fabrication

  • semiconductor growth

  • mbe regrowth

  • patterned surface

  • optoelectronic device

  • solid source molecular beam epitaxy

  • dry etching

  • wet etching

  • corrugated quaternary surface

  • dfb grating

  • planarization

  • mesa structure

  • butt-coupling integration

  • inp

  • Cookie settings
  • Imprint
  • Privacy policy
  • Api
  • Contact
© 2024