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1997
Conference Paper
Title
MBE regrowth of InP on patterned surfaces and its application potential for optoelectronic devices
Abstract
High-quality InP material was grown with solid source molecular beam epitaxy (SSMBE) using a GaP source. Dry- as well as wet-etched corrugated quaternary surfaces (DFB-gratings) were successfully regrown with InP, fully planarized final surfaces were obtained in each case. Finally, InP regrowth on mesa structures demonstrates favourable conditions for butt-coupling integration schemes.
Keyword(s)
diffraction gratings
iii-v semiconductors
indium compounds
molecular beam epitaxial growth
optical fabrication
semiconductor growth
mbe regrowth
patterned surface
optoelectronic device
solid source molecular beam epitaxy
dry etching
wet etching
corrugated quaternary surface
dfb grating
planarization
mesa structure
butt-coupling integration
inp