2008
Poster
Titel

UV nanoimprint lithography process optimization for electron device manufacturing on nanosized scale
Titel Supplements
Poster at MNE 2008, 34th International Conference on Micro and Nano Engineering, Athens, Greece
Alternative
Prozessoptimierung für die UV Nanoimprint Lithografie zur Herstellung nanoskaliger elektronischer Bauelemente
Author(s)
Schmitt, H.
Amon, B.
Petersen, S.
Rommel, M.
Bauer, A.J.
Ryssel, H.
Konferenz
DOI
File(s)
Language
English
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