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2010
Conference Paper
Title

Next-generation test equipment for micro-production

Abstract
The paper introduces different approaches to overcome the large ratio between wafer size and feature size in the testing step of micro production. For the inspection of Micro(Opto)ElectroMechanicalSystems (M(O)EMS) a priori information are available to optimise the inspection process. The EU-project SMARTIEHS develops a new concept for high volume M(O)EMS testing. The design of the test station and the fabrication of the first components are presented and the advancements compared to the state of the art are introduced within the following fields: micro-optical interferometer design, micro-optical production, smart-pixel camera and mechanical design. Furthermore the first demonstrators are introduced and experimental results are presented.
Author(s)
Zeitner, U.
Dannberg, P.
et al.
Mainwork
Optical Micro- and Nanometrology III  
Conference
Conference "Optical Micro- and Nanometrology" 2010  
DOI
10.1117/12.855087
Language
English
Fraunhofer-Institut für Angewandte Optik und Feinmechanik IOF  
Keyword(s)
  • micro optic

  • low-coherence interferometry

  • laser interferometry

  • micro optics processing

  • interferometer array

  • smart pixel camera

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