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  4. Direct UV-imprinting of hybrid-polymer photonic microring resonators and their characterization
 
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2014
Journal Article
Title

Direct UV-imprinting of hybrid-polymer photonic microring resonators and their characterization

Abstract
The direct patterning of hybrid-polymer microring resonators with minimal residual layers by UV-assisted nanoimprint lithography is reported. The proposed stamp-and-repeat technology requires no post-processing. The imprint polymer was applied by spin-coating as a 130-150 nm thin initial film for an optimized processing. The importance of the initial film thickness is discussed in detail. Aspect ratios of more than 5:1 were realized with 2 mu m high ridge-waveguides and sub-400 nm coupling gaps on maximal 130 nm thin residual layers. The achieved ratio of structure height to residual layer thickness of 15.4 (2 mu m versus 130 nm) was much larger than the typical values in high-resolution imprinting and superseded the removal of the residual layer completely. The resonators are thought as biosensor transducers. High quality devices with Q-factors up to 13 000 were produced with a minimal set of process steps.
Author(s)
Kirchner, R.
Finn, A.
Landgraf, R.
Nueske, L.
Teng, L.C.
Vogler, M.
Fischer, W.-J.
Journal
Journal of Lightwave Technology  
Funder
Deutsche Forschungsgemeinschaft DFG  
Bundesministerium für Bildung und Forschung BMBF (Deutschland)  
DOI
10.1109/JLT.2014.2310054
Language
English
Fraunhofer-Institut für Photonische Mikrosysteme IPMS  
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