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  4. Metrology and irradiation systems for accelerated testing of EUVL components
 
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September 20, 2020
Conference Paper
Title

Metrology and irradiation systems for accelerated testing of EUVL components

Abstract
Fraunhofer ILT has been developing EUV sources for more than 2 decades and has been developing multitude of EUV applications in collaboration with RWTH Aachen University, e.g., EUV laboratory-scale lithography for patterning and resist testing with demonstrated resolution of 28 nm HP or EUV reflectometry for surface sensitive analysis. Newest is the Fraunhofer high Irradiance Tool (FIT) for accelerated testing of optical components. Outline specs include: EUV irradiance >40 W/cm², angle of incidence on sample <5°, spot diameter >1.8 mm, repetition rate up to 2.5 kHz (10 kHz multiplexed), EUV power at focus >3 W, clean and controllable sample atmosphere.
Author(s)
Vieker, Jochen  
Fraunhofer-Institut für Lasertechnik ILT  
Bergmann, Klaus  
Fraunhofer-Institut für Lasertechnik ILT  
Danylyuk, Serhiy  
Fraunhofer-Institut für Lasertechnik ILT  
Brose, Sascha
RWTH Aachen University  
Mainwork
Extreme Ultraviolet Lithography 2020  
Conference
Conference "Extreme Ultraviolet Lithography" 2020  
DOI
10.1117/12.2573152
Language
English
Fraunhofer-Institut für Lasertechnik ILT  
Keyword(s)
  • Extreme ultraviolet

  • Extreme ultraviolet lithography

  • Metrology

  • Atmospheric particles

  • Lithography

  • Optical components

  • Optical lithography

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