Metrology and irradiation systems for accelerated testing of EUVL components
Abstract
Fraunhofer ILT has been developing EUV sources for more than 2 decades and has been developing multitude of EUV applications in collaboration with RWTH Aachen University, e.g., EUV laboratory-scale lithography for patterning and resist testing with demonstrated resolution of 28 nm HP or EUV reflectometry for surface sensitive analysis. Newest is the Fraunhofer high Irradiance Tool (FIT) for accelerated testing of optical components. Outline specs include: EUV irradiance >40 W/cm², angle of incidence on sample <5°, spot diameter >1.8 mm, repetition rate up to 2.5 kHz (10 kHz multiplexed), EUV power at focus >3 W, clean and controllable sample atmosphere.
