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  4. Metrology and irradiation systems for accelerated testing of EUVL components
 
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20 September 2020
Conference Paper
Titel

Metrology and irradiation systems for accelerated testing of EUVL components

Abstract
Fraunhofer ILT has been developing EUV sources for more than 2 decades and has been developing multitude of EUV applications in collaboration with RWTH Aachen University, e.g., EUV laboratory-scale lithography for patterning and resist testing with demonstrated resolution of 28 nm HP or EUV reflectometry for surface sensitive analysis. Newest is the Fraunhofer high Irradiance Tool (FIT) for accelerated testing of optical components. Outline specs include: EUV irradiance >40 W/cm², angle of incidence on sample <5°, spot diameter >1.8 mm, repetition rate up to 2.5 kHz (10 kHz multiplexed), EUV power at focus >3 W, clean and controllable sample atmosphere.
Author(s)
Vieker, Jochen
Fraunhofer-Institut für Lasertechnik ILT
Bergmann, Klaus
Fraunhofer-Institut für Lasertechnik ILT
Danylyuk, Serhiy
Fraunhofer-Institut für Lasertechnik ILT
Brose, Sascha
RWTH Aachen University
Hauptwerk
Extreme Ultraviolet Lithography 2020
Konferenz
Conference "Extreme Ultraviolet Lithography" 2020
Thumbnail Image
DOI
10.1117/12.2573152
Language
English
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Fraunhofer-Institut für Lasertechnik ILT
Tags
  • Extreme ultraviolet

  • Extreme ultraviolet lithography

  • Metrology

  • Atmospheric particles

  • Lithography

  • Optical components

  • Optical lithography

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