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2003
Journal Article
Title
Development of a 2"-AlGaN/GaN HEMT technology on sapphire and SiC for mm-wave high-voltage power applications
Other Title
Entwicklung einer 2"-AlGaN/GaN HEMT Technologie auf Saphir- und SiC Substraten für mm-Wellen Hochspannungs- und Hochleistungsanwendungen
Abstract
The suitability of AlGaN/GaN HEMTs on SiC is discussed with respect to mm-wave applications at 40 GHz and beyond. A 0.15 µm T-gate AlGaN/GaN-HEMT 2-inch technology on SiC and sapphire was developed for high power applications and for frequencies beyond 30 GHz. Large periphery devices with 0.48 mm gate width show a cw output power of 0.86 W at 40 GHz. AlGaN/GaN dual-gate HEMTs show MSG/MAG of >13 dB at 60 GHz with 0.15 µm gate length.
Author(s)