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  4. Reliability of passivated 0.15 mu m InAlAs/InGaAs HEMT's with pseudomorphic channel
 
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1999
Conference Paper
Title

Reliability of passivated 0.15 mu m InAlAs/InGaAs HEMT's with pseudomorphic channel

Other Title
Zuverlässigkeit von passivierten 0.15 mu m InAlAs/InGaAs HEMTs mit pseudomorphem Kanal
Abstract
Accelerated life tests of 0. 15 mu m gate length InAlAs/InGaAs HEMTs were performed under DC electrical stress at four temperatures in nitrogen. By defining a 100 per cent-degradation of transconductance as failure criterion we found an activation energy of 1.8 eV and a projected life time of 5x10(exp 6) h at 125 degree ambient temperature. The degradation was found to be much faster in air than in nitrogen. High temperature storage tests showed that our devices are not sensitive to hydrogen.
Author(s)
Dammann, Michael  
Fraunhofer-Institut für Angewandte Festkörperphysik IAF  
Chertouk, M.
Fraunhofer-Institut für Angewandte Festkörperphysik IAF  
Jantz, W.
Fraunhofer-Institut für Angewandte Festkörperphysik IAF  
Köhler, Klaus  
Fraunhofer-Institut für Angewandte Festkörperphysik IAF  
Schmidt, Klaus
Weimann, G.
Fraunhofer-Institut für Angewandte Festkörperphysik IAF  
Mainwork
IEEE International Reliability Physics Symposium 1999. Proceedings  
Conference
International Reliability Physics Symposium 1999  
DOI
10.1109/RELPHY.1999.761599
Language
English
Fraunhofer-Institut für Angewandte Festkörperphysik IAF  
Keyword(s)
  • Fluor

  • fluorine

  • HEMT

  • InP

  • Lebensdauer

  • life time

  • reliability

  • Zuverlässigkeit

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