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Evaluation of an advanced submicron X-ray stepper -XRS200- pattern transfer and alignment accuracy
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1991
Journal Article
Title
Evaluation of an advanced submicron X-ray stepper -XRS200- pattern transfer and alignment accuracy
Author(s)
Simon, K.
Gabeli, F.
Journal
Microelectronic engineering
Conference
International Conference on Microlithography: Microcircuit Engineering (ME) 1990
DOI
10.1016/0167-9317(91)90100-R
Language
English
Fraunhofer-Institut für Siliziumtechnologie ISIT
