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Development and characterization of a novel CoXN barrier film for future semiconductor technology nodes
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2015
Master Thesis
Title
Development and characterization of a novel CoXN barrier film for future semiconductor technology nodes
Thesis Note
Dresden, TU, Master Thesis, 2015
Author(s)
Dhavamani, Abitha
Advisor(s)
Bartha, Johann Wolfgang
Technische Universität <Dresden, Germany>
Person Involved
Uhlig, Benjamin
Fraunhofer-Institut für Photonische Mikrosysteme IPMS
Publishing Place
Dresden
Language
English
Fraunhofer-Institut für Photonische Mikrosysteme IPMS