• English
  • Deutsch
  • Log In
    Password Login
    Research Outputs
    Fundings & Projects
    Researchers
    Institutes
    Statistics
Repository logo
Fraunhofer-Gesellschaft
  1. Home
  2. Fraunhofer-Gesellschaft
  3. Abschlussarbeit
  4. Development and characterization of a novel CoXN barrier film for future semiconductor technology nodes
 
  • Details
  • Full
Options
2015
Master Thesis
Title

Development and characterization of a novel CoXN barrier film for future semiconductor technology nodes

Thesis Note
Dresden, TU, Master Thesis, 2015
Author(s)
Dhavamani, Abitha
Advisor(s)
Bartha, Johann Wolfgang
Technische Universität <Dresden, Germany>
Person Involved
Uhlig, Benjamin
Fraunhofer-Institut für Photonische Mikrosysteme IPMS  
Publishing Place
Dresden
Language
English
Fraunhofer-Institut für Photonische Mikrosysteme IPMS  
  • Cookie settings
  • Imprint
  • Privacy policy
  • Api
  • Contact
© 2024