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  4. Metamorphic HEMT technology for low-noise applications
 
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2009
Conference Paper
Title

Metamorphic HEMT technology for low-noise applications

Other Title
Metamorphe HEMT Technologie für rauscharme Anwendungen
Abstract
Different noise sources in HEMTs are discussed, and state-of-the-art low-noise amplifiers based on the Fraunhofer IAF 100 nm and 50 nm gate length metamorphic HEMT (mHEMT) process are presented. These mHEMT technology feature an extrinsic fT of 220 / 375 GHz and an extrinsic transconduction gm, max of 1300 / 1800 mS/mm. By using the 50 nm technology several low-noise amplifier MMICs were realized. A small signal gain of 21 dB and a noise figure of 1.9 dB was measured in the frequency range between 80 and 100 GHz at ambient temperature. To investigate the low temperature behaviour of the 100 nm technology, single 4 * 40 ?m mHEMTs were integrated in hybrid 4 - 8 GHz (Chalmers) and 16 - 26 GHz (Yebes) amplifiers. At cryogenic temperatures noise temperatures of 3 K at 5 GHz and 12 K at 22 GHz were achieved.
Author(s)
Leuther, Arnulf  
Fraunhofer-Institut für Angewandte Festkörperphysik IAF  
Tessmann, Axel  orcid-logo
Fraunhofer-Institut für Angewandte Festkörperphysik IAF  
Kallfass, I.
Fraunhofer-Institut für Angewandte Festkörperphysik IAF  
Lösch, R.
Fraunhofer-Institut für Angewandte Festkörperphysik IAF  
Seelmann-Eggebert, M.
Fraunhofer-Institut für Angewandte Festkörperphysik IAF  
Wadefalk, N.
Schäfer, F.
Gallego Puyol, J.D.
Schlechtweg, M.
Fraunhofer-Institut für Angewandte Festkörperphysik IAF  
Mikulla, Michael  
Fraunhofer-Institut für Angewandte Festkörperphysik IAF  
Ambacher, Oliver  
Fraunhofer-Institut für Angewandte Festkörperphysik IAF  
Mainwork
IPRM 2009, IEEE International Conference on Indium Phosphide & Related Materials. Proceedings  
Conference
International Conference on Indium Phosphide and Related Materials (IPRM) 2009  
DOI
10.1109/ICIPRM.2009.5012475
Language
English
Fraunhofer-Institut für Angewandte Festkörperphysik IAF  
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