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Effects of heavy metal contamination from corrosive gas and dopant handling equipment in silicon wafer processing
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1984
Journal Article
Title
Effects of heavy metal contamination from corrosive gas and dopant handling equipment in silicon wafer processing
Author(s)
Klausmann, E.
Eisele, K.M.
Journal
Solid state technology
Language
English
Fraunhofer-Institut für Angewandte Festkörperphysik IAF
Keyword(s)
Getterwirkung
Lebensdauer
Minoritaetstraeger
Phosphorsilikatglas
Schwermetallverunreinigung
