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1995
Conference Paper
Title
Submicron InGaAs/InP MSM photodetectors for operation at 1.55 mu m
Abstract
The implementation of future high-speed optical communication networks operating in the 20-40 Gbit/s regime relies on the availability of correspondingly fast photodetectors for the 1.3-1.55 mu m wavelength range. Interdigitated InGaAs metal-semiconductor-metal (MSM) detectors in the InP material system are promising candidates for wideband photoreceivers due to their inherent lower specific capacitance as compared to p-i-n diodes. MSM photodetectors with submicron (0.3 mu m) feature size fabricated by electron beam lithography on 300 nm InGaAs absorption layer exhibit low dark current (<10 nA), a high external quantum yield (23%) and a frequency response up to 40 GHz at 1.55 mu m.
Language
English
Keyword(s)
electron beam lithography
gallium arsenide
iii-v semiconductors
indium compounds
metal-semiconductor-metal structures
optical communication equipment
optical receivers
photodetectors
submicron msm photodetectors
high speed optical communication networks
metal-semiconductor-metal detectors
wideband photoreceivers
specific capacitance
submicron feature size
absorption layer
low dark current
high external quantum yield
frequency response
0.3 micron
10 na
40 GHz
20 to 40 Gbit/s
1.3 to 1.55 micron
InGaAs-InP