Multi parallel ultrashort pulse laser processing

Ultra-short pulse lasers present a new class within high-performance laser beam sources for industrial applications [1]. Due to the outstanding features of the radiation emitted from these sources, which are addressing important physical principles of light-matter interaction, traditional processes of deposition of light energy into the material can be circumvented. With pulse durations in the picosecond and femtosecond range, the absorbed energy is concentrated in the material to a few nanometers, so that thermal damage to the materials can be avoided.