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2003
Conference Paper
Title
Dry PSG etching for multicrystalline silicon solar cells
Abstract
A dry plasma etching process for Phosphor Silicate Glass (PSG) in a SiN-PECVD batch reactor is developed. In the same reactor PSG etching and Anti Reflective Coating (ARC) can be performed successively. To demonstrate industrial feasibility screen printed solar cells are manufactured and compared to cells prepared by a standard wet chemical process.