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  4. A precision current source in SIMOX technology for high temperature applications up to 570 K
 
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1996
Conference Paper
Title

A precision current source in SIMOX technology for high temperature applications up to 570 K

Abstract
This paper describes a precision, pulse-width controlled current source for high temperature applications. The output current is directly proportional to the duty-cycle of a pulse-width modulated input signal. Since the ambient temperature can be as high as 570 K a thin-film SIMOX-CMOS-process has been chosen to fabricate the current source. The power supply voltage of the current source is in the range of 14 V to 30 V. In order to get drain-source-breakdown voltages above 30 V, a drainextention had to be applied. Since even in a SIMOX-process leakage currents dictate the performance limitations of analog, integrated CMOS circuits with respect to temperature, film contacts and a H-shaped gate layout of the transmission gate transistors is necessary. The applied modifications result in drain-source-breakdown voltages above 30V and low leakage currents even at high temperatures.
Author(s)
Verbeck, M.
Fiedler, H.-L.
Mainwork
3rd International High Temperature Electronics Conference 1996. Transactions. Vol.1  
Conference
International High Temperature Electronics Conference 1996  
Language
English
Fraunhofer-Institut für Mikroelektronische Schaltungen und Systeme IMS  
Keyword(s)
  • Hochtemperaturtechnik

  • Mikroelektronik

  • Schaltungsentwurf

  • Silizium-Gate-Technologie

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