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  4. Application of electron tomography for semiconductor device analysis
 
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2006
Conference Paper
Title

Application of electron tomography for semiconductor device analysis

Author(s)
Kübel, C.
Kujawa, M.
Luo, J.-S.
Lo, H.M.
Russel, J.D.
Mainwork
Stress-induced phenomena in metallization  
Conference
International Workshop on Stress Induced Phenomena in Metallization 2005  
DOI
10.1063/1.2173554
Language
English
Fraunhofer-Institut für Fertigungstechnik und Angewandte Materialforschung IFAM  
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