English
Deutsch
Log In
Log in with Fraunhofer Smartcard
Password Login
Have you forgotten your password?
Research Outputs
Fundings & Projects
Researchers
Institutes
Statistics
Fraunhofer-Gesellschaft
Home
Fraunhofer-Gesellschaft
Konferenzschrift
Application of electron tomography for semiconductor device analysis
Details
Full
Export
Statistics
Options
Show all metadata (technical view)
2006
Conference Paper
Title
Application of electron tomography for semiconductor device analysis
Author(s)
Kübel, C.
Kujawa, M.
Luo, J.-S.
Lo, H.M.
Russel, J.D.
Mainwork
Stress-induced phenomena in metallization
Conference
International Workshop on Stress Induced Phenomena in Metallization 2005
DOI
10.1063/1.2173554
Language
English
Fraunhofer-Institut für Fertigungstechnik und Angewandte Materialforschung IFAM