Preparation of multilayered film structures by laser arcs.

The new method of laser-sustained arc evaporation combines the advantages of the laser pulse vapour deposition (LPVD) technique with the technologically utilized vacuum arc evaporation method. The laser arc may be effectively and precisely controlled like LPVD but its energetic efficiency and the mechanical properties of the deposits equal those obtained by vacuum arcs. In the present paper the latest results of the technological development of the laser arc method are presented. Investigations of the arc ignition process and the influence of arc current pulse shape on target erosion and film deposition were carried out for different materials. On the basis of these results a controlled deposition of definite multilayered structures may be carried out. As an example a Ti/TiC multilayer system with 25 nm single layers is described. Results of structural and chemical analysis by means of Auger electron spectroscopy are presented. Deposition rates of 1-5 nm s high minus 1 may be achieved even with the present experimental arrangement. A scheme for a full-scale technological device for multilayer preparation by laser arcs, which is currently under construction, will be presented.