Pulsed laser deposition of x-Ray optical layer stacks with atomically flat interfaces

Pulsed laser deposition is described as a technique for the synthesis of multilayer showing X-ray optical quality. The state of the art is characterized by results that demonstrate a development of the instrumental basis superior to that of conventional PLD systems. Multilayers of the Ni/C-, Mo/Si- and W/C-types prove the versatility of the method and the output of layer stack characterization by HREM SPM, XD, AES, XPS, ellipsometry and image processing ensures a high quality with regard to stack regularity, layer homogeneity and interface smoothness.