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  4. Clean technology for the ultra barrier layer production
 
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2010
Presentation
Title

Clean technology for the ultra barrier layer production

Title Supplement
Presentation held at Flat Panel Display Materials and Manufacturing Equipment; 36th Working Group Meeting of the German Flat Panel Display Forum (DFF), December 8/9, 2010, Stuttgart
Abstract
Thin film based industries (OLED; Organic photovoltaic, CIS-thin film photovoltaic) require very dense layers. Fraunhofer IPA investigations showed that besides process parameters also contamination have an impact on the barrier of a layers. The main contamination risks are particles on substrates regarding layer penetration. Airborne molecular contamination (AMC) caused e.g. by out-gassing of materials can have a strong impact as well.
Author(s)
Bürger, Frank  
Conference
German Flat Panel Display Forum (DFF Working Group Meeting) 2010  
File(s)
Download (1017.91 KB)
Rights
Use according to copyright law
DOI
10.24406/publica-fhg-368747
Language
English
Fraunhofer-Institut für Produktionstechnik und Automatisierung IPA  
Keyword(s)
  • Clean manufacturing

  • cleanroom technology

  • Layer Manufacturing Technology (LMT)

  • Airborne Molecular Contamination (AMC)

  • contamination control

  • equipment design

  • particle detection

  • organic light emitting diode (OLED)

  • Reinraum

  • Substrat

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