• English
  • Deutsch
  • Log In
    Password Login
    or
  • Research Outputs
  • Projects
  • Researchers
  • Institutes
  • Statistics
Repository logo
Fraunhofer-Gesellschaft
  1. Home
  2. Fraunhofer-Gesellschaft
  3. Artikel
  4. Atomistic evalution of diffusion theories for the diffusion of dopants in vacancy gradients
 
  • Details
  • Full
Options
1995
Journal Article
Titel

Atomistic evalution of diffusion theories for the diffusion of dopants in vacancy gradients

Abstract
A new approach is used for the calculation of transport coefficients for dopants and vacancies from atomic jump frequencies in the presence of dopant or vacancy gradients. Results are shown for the diffusion under vacancy gradients with an attractive potential between the dopant and the defect. It is demonstrated that for a given vacancy gradient not only the absolute value but also the sign of the dopant flux depends on the range of the binding potential.
Author(s)
List, S.
Pichler, P.
Ryssel, H.
Zeitschrift
Microelectronics journal
Thumbnail Image
DOI
10.1016/0026-2692(95)98928-K
Language
English
google-scholar
IIS-B
Tags
  • Diffusionsmechanismus

  • Gitterleerstellen

  • Paardiffusion

  • Cookie settings
  • Imprint
  • Privacy policy
  • Api
  • Send Feedback
© 2022