New Illumination Technology for Mask Aligner Lithography

Nowadays, integrated semiconductor circuits are used as components in nearly every electrical device. This would be difficult to imagine without the application of photolithography, one of the essential manufacturing methods in semiconductor and microsystem technology. In a German research project run by the Friedrich Schiller University Jena in collaboration with the Fraunhofer IOF, the conventionally used mercury vapor lamp for mask aligner lithography has been replaced by a laser from the manufacturer InnoLas Photonics and has opened completely new perspectives.