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  4. Growth and characterization of ZnSe grown on GaAs by hot-wall epitaxy.
 
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1990
Journal Article
Titel

Growth and characterization of ZnSe grown on GaAs by hot-wall epitaxy.

Alternative
Wachstum und Charakterisierung von ZnSe auf GaAs mittels hot-wall Epitaxie
Abstract
ZnSe was grown successfully on (100)GaAs by hot-wall epitaxy. The crystal quality and orientation of the ZnSe layers were studied by X-ray diffraction and cathodoluminescence at room temperature and 17 K. For the first time (111)ZnSe layers on (100)GaAs have been grown. The influence of the preheating procedure of the GaAs substrate, the substrate temperature and of the Zn-to - Se vapour ratio was observed. The (100)-oriented ZnSe layers show very good cathodoluminescence properties at 17 K and at room temperature.
Author(s)
As, D.J.
Rothemund, W.
Hingerl, K.
Sitter, H.
Zeitschrift
Journal of Crystal Growth
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Language
English
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Fraunhofer-Institut für Angewandte Festkörperphysik IAF
Tags
  • cathodoluminescence

  • hot-wall epitaxy

  • Kathodolumineszenz

  • Röntgenstrahldiffraktometrie

  • x-ray diffraction

  • ZnSe/GaAs

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