Patent
Title

Sputtertarget und seine Verwendung

Other Title
Sputter target and its application
Abstract
A sputtering target contains a material of component having two or more phases, in which one phase is formed by metal oxide forming matrix and embedded in elemental metal or metal alloy.
Inventor(s)
Herzog, A.
Schultheis, M.
Schneider-Betz, S.
Schlott, M.
Dewald, Wilma  
Link to:
Patent Number
2011-2584062
Publication Date
2011
Language
German