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  4. Vakuumbeschichtungsanlage mit einer Beschichtungskammer und zumindest einer Quellenkammer
 
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Patent
Title

Vakuumbeschichtungsanlage mit einer Beschichtungskammer und zumindest einer Quellenkammer

Other Title
Vacuum coating installation - comprising coating chamber vacuum-tight separable from the source chambers which can be put under vacuum.
Abstract
Vacuum coating installation includes a coating chamber (1) which can be put under vacuum and accommodates a substrate (13) to be coated, and at least one source chamber (3, 3') which is connected to the coating chamber, and houses a source in the form of a cathode (4) for the source material. The coating chamber is vacuum-tight separable from the source chambers which can be put under vacuum. USE - For substrate coating. ADVANTAGE - Drawbacks (contamination of the coating material, low coating uniformity in the case of larger substrates, poor utilisation of the cathode material) of known installations are eliminated.
Inventor(s)
Mielsch, G.
Schalausky, R.
Giersch, D.
Scheibe, H.J.
Link to Espacenet
http://worldwide.espacenet.com/publicationDetails/biblio?DB=worldwide.espacenet.com&locale=en_EP&FT=D&CC=DE&NR=19628102A
Patent Number
1996-19628102
Publication Date
2000
Language
German
Fraunhofer-Institut für Werkstoff- und Strahltechnik IWS  
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