Verfahren zur Herstellung elektrischer Leiterstrukturen im Nanometerbereich sowie deren Verwendung als impedimetrischer Sensor

Beschrieben wird ein Verfahren zur Herstellung elektrischer Leiterstrukturen im Nanometerbereich sowie deren Verwendung in einem impedimetrischen biochemischen Sensor. Die Erfindung zeichnet sich dadurch aus, dass unter Verwendung eines, eine Oberflaechentopografie aufweisenden dielektrischen Flaechensubstrats, deren Oberflaechentopografie eine Vielzahl, weitgehend parallel zueinander verlaufender, ueber die Oberflaeche des Flaechensubstrats erhabener Kantenzuege aufweist, eine das Flaechensubstrat mit elektrisch leitendem Material beaufschlagende Schraegbeschattung derart durchgefuehrt wird, dass sich das elektrisch leitende Material bevorzugt an den Kantenzuegen absetzt.

WO 200129549 A UPAB: 20010607 NOVELTY - To produce impedimetric sensors, with an electrical conductor structure (4) in the nanometer range between two electrodes (1,2) in an electrode array, a dielectric substrate (3) surface is selected with a surface topography of a number of projecting parallel angular contours. This provides an angular shadowing for the deposit of electrically conductive material which settles on the angular contours. DETAILED DESCRIPTION - To produce impedimetric sensors, with an electrical conductor structure (4) in the nanometer range between two electrodes (1,2) in an electrode array, a dielectric substrate (3) surface is selected with a surface topography of a number of projecting parallel angular contours. This provides an angular shadowing for the deposit of electrically conductive material which settles on the angular contours. The angular shadowing is a precipitation, preferably an anisotropic vapor action, where the electrically conductive material is precipitated at an angle to the substrate surface and at right angles to the parallel angular contours. The substrate surface is a semi-crystalline thin polymer film, with nano crystals embedded in an amorphous matrix and at the surface they project to form the angular contours. The surface topography is preserved by ion etching in silicon or silicon dioxide or by embossing with a tool with a nano structured surface such as nano imprinting in a polymer substrate. The conductor structure is fitted between two electrodes, to give a concentration of the electrical fields near the surface between the electrodes. The conductor structure is at right angles to the electrical field lines (5) between the electrodes. USE - The impedimetric sensor is for measurements by impedance or capacitance to determine biochemical reactions. It is also for the detection of molecular bonds, preferably in hybridizing a DNA with oligonucleotides or bonds between antibodies to antigens. ADVANTAGE - The structure forms nano wires for the electrically conductive array between the electrodes, with a diameter of 1-500 nm, giving an impedimetric biochemical sensor with increased sensitivity, at significantly lower costs.