Patent
Title

Einrichtung zur Erzeugung dichter Plasmen in Vakuumprozessen

Other Title
Plasma process for coating of substrates - has plasma produced by interaction of electron beam and metal vapour from aluminium source, with anode, hollow cathode and magnet arrangement giving guide field in long axis.
Abstract
The plasma process is used for coating a substrate (4) with AlxOy and a vapour is generated from an aluminium source (3) in a vacuum chamber (2). The plasma is produced by an electron beam (12) directed into the vapour stream. The system consists of an anode (7), cathode (6) and an electromagnet (10). The electron beam is directed through the magnetic field and into the vapour. USE/ADVANTAGE - Surface coating of substrates, such as packaging foil materials. Improved performance.
Inventor(s)
Morgner, H.
Neumann, M.
Straach, S.
Link to Espacenet
Patent Number
1995-19546827
Publication Date
1999
Language
German