Vorrichtung zum Anregen elektrischer Entladungen mittels getakteter Spannungsspitzen

The gas discharge excitation method uses an applied AC voltage with a frequency of between 500Hz and 50kHz, which is insufficient to trigger the gas discharge and superimposed transient voltage pulses (A,B) used for increasing the energy level to initiate the gas discharge. The transient voltage pulses may have a rise time of less than 5 microsec, with different pulses superimposed on each half wave of the basic AC voltage signal adjacent the maximum voltage amplitude. USE - For plasma process used for semiconductor manufacture.