VERFAHREN ZUR TROCKENENTWICKLUNG EINER SILIZIUMHALTIGEN ULTRAVIOLETT- UND/ODER ELEKTRONENSTRAHLEMPFINDLICHEN LACKSCHICHT

A process for the dry development of a varnish coating containing silicon and sensitive to ultraviolet or electron beam radiation has the following features: - The varnish layer consists of homogeneous vinyl groups, SiO<-2, silicon and hydrocarbon chains, their chemical property is modified to such an extent by exposure to light that a latent image is formed, and - the development of the latent image takes place by means of an etching gas mixture in the plasma which comprises at least two etching gases which are capable of transferring the common silicon and carbon in a volatile compound, whereby at least one of the etching gases has a tendency to polymerization.