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Patent
Title

Verfahren zum Elektronenstrahlverdampfen

Other Title
Process and device for electron beam deposition
Abstract
In an electron beam vapour deposition process in conjunction with arc discharge, cathode focal points occur, causing the formation of droplets. These droplets have a very negative influence on the quality of the layers. According to the invention, a periodically deflectable, high-energy electron beam moves on the vapour deposition material in order to form a more or less evenly heated area in which a high vaporization rate occurs. In this area, an arc discharge is ignited and its arc forms diffusely and expands over the said area. A high proportion of the vapour is ionized. During the process, no process gas in supplied. The invention is used for coating components, tools and strip steel and can also be used reactively.
Inventor(s)
Schiller, S.
Goedicke, K.
Reschke, J.
Scheffel, B.
Metzner, C.
Kern, H.
Link to Espacenet
http://worldwide.espacenet.com/publicationDetails/biblio?DB=worldwide.espacenet.com&locale=en_EP&FT=D&CC=DE&NR=4336680A
Patent Number
1993-4336680
Publication Date
1998
Language
German
Fraunhofer-Institut für Organische Elektronik, Elektronenstrahl- und Plasmatechnik FEP  
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