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Patent
Title

Sensor und Verfahren zu dessen Herstellung

Other Title
Sensor and process for its manufacture
Abstract
A sensor comprises a semiconductor substrate which is covered by a diaphragm which is provided with a sensor structure which has a semiconductor area. According to the invention, at least the semiconductor area of the sensor structure is arranged on the side of the diaphragm facing a recess in the semiconductor substrate. The semiconductor area can be formed as a monocrystalline semiconductor in this way
Inventor(s)
Lang, W.
Folkmer, B.
Link to:
Espacenet
Patent Number
1993-4303423
Publication Date
1996
Language
German
Fraunhofer-Institut für Zuverlässigkeit und Mikrointegration IZM  
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