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  4. C-adsorption behaviour of thin fluoride films
 
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1994
Journal Article
Title

C-adsorption behaviour of thin fluoride films

Abstract
The adsorption behaviour of physically vapour deposited MgF2, LaF2, CaF2, and LiF films on non-heated substrates has been investigated gravimetrically and spectroscopically. It was also shown that the adsorption behaviour differs between the two growth groups into which the fluorides are divided. The strong adsorption of saturated hydrocarbons in CaF2 and LiF films, measured by Fourier transform infrared spectroscopy after maintaining for two years at atmospheric pressure, can be explained by calculation of the water filling degree of the pores and with the assumption of a pore size distribution of the film pores.
Author(s)
Kaiser, N.
Kaiser, U.
Journal
Thin solid films  
DOI
10.1016/0040-6090(94)90269-0
Language
English
Fraunhofer-Institut für Angewandte Optik und Feinmechanik IOF  
Keyword(s)
  • Dünne optische Schicht

  • excimer laser optics

  • fluoride thin films

  • Fluoridschicht

  • laser induced damage threshold

  • Laserzerstörschwelle

  • optical coating

  • optical thin films

  • oxide thin films

  • Oxidschicht

  • ultraviolet spectral region

  • ultravioletter Spektralbereich

  • UV

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