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Plasma deposition of a-C/H films - the role of process gas, plasma chemistry and plasma surface interaction

: Koidl, P.; Wagner, J.; Wild, C.

E-MRS Spring Meeting 1987. Proceedings. Vol.XVII
Paris: Les Editions de Physique, 1987
pp.137 ff
European Materials Research Society (Spring Meeting) <1987, Strasbourg>
Conference Paper
Fraunhofer IAF ()
amorpher Kohlenstoff; Plasmaabscheidung; Prozeßcharakterisierung

Raman and photoluminescence spectroscopy are reviewed and discussed as tools for the characterization of hydrogenated amorphous carbon (a-C:H) films. Thereby emphasis is laid on hard, strongly cross-linked films. Photoluminescence provides a quick measure for the film characteristic, either hard or soft and "polymerlike". Raman spectroscopy allows the analysis of extremely thin a-C:H films down to a layer thickness of approximate 10 A as well as the study of the film-substrate interface. Using electronic resonance effects Raman scattering gives insight into the microscopic structure of the films. In hard a-C:H experimental evidence is found for clustered sp2 sites connected by sp3 carbon. (IAF)