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  4. Influence of substrate cleaning on LIDT of 355 nm HR coatings
 
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1997
Conference Paper
Title

Influence of substrate cleaning on LIDT of 355 nm HR coatings

Abstract
An advanced high-purity reactive e-beam evaporation process was used to deposit Al2O3/SiO2 HR coatings for 355 nm (Nd: YAG third harmonic) high-power laser applications. Both 1:1 an R:1, 6 ns pulse width, laser-induced damage threshold (LIDT) tests for normal (0 deg) and non-normal (45 deg) incident designs were performed to study the influence of quartz substrate cleaning. Damage test results indicate very high LIDT values on clean substrates. Some tested points have R:1 LIDT above 20 J/cm2. Post-cleaning of coated substrates degrades LIDT.
Author(s)
Kaiser, N.
Schallenberg, U.B.
Dijon, J.
Garrec, P.
Mainwork
Laser-induced damage in optical materials 1996. Proceedings  
Conference
Symposium on Optical Materials for High-Power Lasers 1996  
DOI
10.1117/12.274290
Language
English
Fraunhofer-Institut für Angewandte Optik und Feinmechanik IOF  
Keyword(s)
  • Dünne optische Schicht

  • excimer laser optics

  • Excimer-Laser-Optik

  • fluoride thin films

  • Fluoridschicht

  • laser induced damage threshold

  • Laserzerstörschwelle

  • optical coating

  • optical thin films

  • oxide thin films

  • Oxidschicht

  • ultraviolet spectral region

  • ultravioletter Spektralbereich

  • UV

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